Plano, TX, United States of America

Shinya Nishio


Average Co-Inventor Count = 11.1

ph-index = 2

Forward Citations = 21(Granted Patents)


Location History:

  • Musashimurayama, JP (1998 - 2000)
  • Plano, TX (US) (1999 - 2005)

Company Filing History:


Years Active: 1998-2005

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5 patents (USPTO):Explore Patents

Title: Shinya Nishio: Innovator in Semiconductor Technology

Introduction

Shinya Nishio is a prominent inventor known for his contributions to semiconductor technology. He is based in Plano, Texas, and has been awarded five patents throughout his career. His work primarily focuses on improving the efficiency and performance of semiconductor integrated circuit devices.

Latest Patents

One of Shinya Nishio's latest patents is a method of manufacturing semiconductor integrated circuit devices that feature a memory device with reduced bit line stray capacity. This innovation involves a dynamic random-access memory (DRAM) that includes multiple word lines, each covered with a first insulating film. Additionally, it features bit lines that are insulated from and transverse to the word lines, covered with a second insulating film. The memory cells are strategically placed at the intersections of the word and bit lines, incorporating capacitors and memory cell selection transistors. The design allows for self-aligned contact holes for connections between semiconductor regions and capacitors, as well as between semiconductor regions and bit lines. The second insulating film is made from a material with a permittivity smaller than that of the first insulating film, enhancing the overall performance of the device.

Career Highlights

Shinya Nishio has had a distinguished career, working with notable companies such as Texas Instruments Corporation and Hitachi, Ltd. His experience in these organizations has significantly contributed to his expertise in semiconductor technology and innovation.

Collaborations

Throughout his career, Shinya has collaborated with talented individuals, including Yoshitaka Tadaki and Songsu Cho. These collaborations have fostered an environment of innovation and have led to advancements in the field of semiconductor devices.

Conclusion

Shinya Nishio's work in semiconductor technology has made a significant impact on the industry. His innovative patents and collaborations with esteemed colleagues highlight his dedication to advancing technology. His contributions continue to influence the development of efficient semiconductor integrated circuit devices.

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