Oshu, Japan

Shinya Nasukawa


Average Co-Inventor Count = 5.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Oshu, JP (2022)
  • Iwate, JP (2023)

Company Filing History:


Years Active: 2022-2023

Loading Chart...
2 patents (USPTO):

Title: Shinya Nasukawa: Innovator in Heat Treatment and Processing Technologies

Introduction

Shinya Nasukawa is a prominent inventor based in Oshu, Japan. He has made significant contributions to the field of heat treatment and processing technologies. With a total of 2 patents to his name, Nasukawa continues to push the boundaries of innovation in his industry.

Latest Patents

Nasukawa's latest patents include a heat treatment apparatus and a processing apparatus. The heat treatment apparatus is designed to accommodate and process multiple substrates in a reduced-pressure environment. It features a processing container, a first heater for heating the substrates, and a plurality of gas supply pipes that deliver gas to various heights within the container. Additionally, a second heater is integrated into one of the gas supply pipes to heat the gas at the lowermost position. The processing apparatus consists of several concatenated process modules and a loader module that receives carriers with multiple substrates. Each process module includes a heat treatment unit and a gas supply unit, ensuring efficient processing of the substrates.

Career Highlights

Shinya Nasukawa is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work focuses on developing advanced technologies that enhance the efficiency and effectiveness of processing equipment.

Collaborations

Nasukawa collaborates with talented individuals such as Kazuyuki Kikuchi and Masato Kadobe. Their combined expertise contributes to the innovative projects at Tokyo Electron Limited.

Conclusion

Shinya Nasukawa is a key figure in the field of heat treatment and processing technologies. His patents reflect his commitment to innovation and excellence in his work. Through his contributions, he continues to shape the future of technology in his industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…