The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2023

Filed:

Mar. 17, 2020
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Kazuteru Obara, Iwate, JP;

Tatsuya Yamaguchi, Iwate, JP;

Yasuaki Kikuchi, Iwate, JP;

Ryuji Kusajima, Iwate, JP;

Shinya Nasukawa, Iwate, JP;

Kazuyuki Kikuchi, Iwate, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); C23C 16/455 (2006.01); H01L 21/324 (2006.01); H01L 21/677 (2006.01); C23C 16/34 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67098 (2013.01); C23C 16/34 (2013.01); C23C 16/455 (2013.01); H01L 21/324 (2013.01); H01L 21/67248 (2013.01); H01L 21/67769 (2013.01);
Abstract

A heat treatment apparatus includes: a processing container configured to accommodate and process a plurality of substrates in multiple tiers under a reduced-pressure environment; a first heater configured to heat the plurality of substrates accommodated in the processing container; a plurality of gas supply pipes configured to supply a gas to positions having different heights in the processing container; and a second heater provided on a gas supply pipe that supplies a gas to a lowermost position among the plurality of gas supply pipes, and configured to heat the gas in the gas supply pipe.


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