Iwate, Japan

Ryuji Kusajima


Average Co-Inventor Count = 4.5

ph-index = 1


Location History:

  • Iwate, JP (2023)
  • Miyagi, JP (2023)

Company Filing History:


Years Active: 2023

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3 patents (USPTO):

Title: Ryuji Kusajima: Innovator in Heat Treatment and Film Forming Technologies

Introduction

Ryuji Kusajima is a prominent inventor based in Iwate, Japan. He has made significant contributions to the fields of heat treatment and film forming technologies. With a total of 3 patents to his name, Kusajima's work has had a notable impact on the industry.

Latest Patents

Kusajima's latest patents include a heat treatment apparatus, a heat treatment method, and a film forming method. The heat treatment apparatus features an inner tube designed to accommodate a substrate, an outer tube that covers the inner tube, and a heater positioned around the outer tube. Additionally, it includes a gas supply pipe extending along the inner tube's longitudinal direction, an opening in the inner tube's side wall, a temperature sensor, and a controller that regulates the heater based on the temperature sensor's readings. The film forming method involves accommodating a substrate in a processing container, supplying an inert gas at a specific flow rate, and alternately supplying multiple gases to form a film on the substrate.

Career Highlights

Kusajima is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His innovative work has contributed to advancements in technology and efficiency in manufacturing processes.

Collaborations

Kusajima has collaborated with notable coworkers, including Kazuteru Obara and Tatsuya Yamaguchi. Their combined expertise has fostered a productive environment for innovation and development.

Conclusion

Ryuji Kusajima's contributions to heat treatment and film forming technologies exemplify his dedication to innovation. His patents reflect a commitment to advancing manufacturing processes, making him a significant figure in his field.

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