Mitaka, Japan

Shinya Kanamitsu


Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 27(Granted Patents)


Location History:

  • Brisbane, CA (US) (1998 - 1999)
  • Mitaka, JP (2004 - 2008)

Company Filing History:


Years Active: 1998-2008

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5 patents (USPTO):Explore Patents

Title: Shinya Kanamitsu: Innovator in Semiconductor Manufacturing

Introduction

Shinya Kanamitsu is a prominent inventor based in Mitaka, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 5 patents. His work focuses on enhancing the accuracy and efficiency of semiconductor device production.

Latest Patents

Kanamitsu's latest patents include a method of manufacturing a semiconductor device that emphasizes the connection of salient electrodes on a semiconductor chip to leads on a film substrate with high accuracy. This innovative approach takes into account changes in lead pitch that occur during the connection process. By making corrections to the pitch of the inner leads beforehand, he ensures a more reliable connection. Additionally, his method addresses the connection of electrodes on a liquid crystal substrate to outer leads on the film substrate, further enhancing the precision of semiconductor manufacturing.

Career Highlights

Throughout his career, Kanamitsu has worked with notable companies such as Hitachi, Ltd. and Hitachi Device Engineering Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor technology.

Collaborations

Some of his notable coworkers include Shinji Tojo and Seiichi Ichihara, who have contributed to his projects and advancements in the field.

Conclusion

Shinya Kanamitsu's contributions to semiconductor manufacturing demonstrate his commitment to innovation and precision. His patents reflect a deep understanding of the complexities involved in semiconductor device production, making him a valuable figure in the industry.

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