Miyagi, Japan

Shinya Ishikawa

This inventor holds 36 USPTO granted patents and 12 published patent applications and 1 EPO patent, primarily in Plasma Processing. Top assignees: Tokyo Electron Limited, Tohoku University, Mitsubishi Hitachi Power Systems, Ltd.. Active years: 2016-2026.

USPTO Granted Patents = 36 

% Patents Active = 91.7


Average Co-Inventor Count = 3.8

ph-index = 2

Forward Citations = 31(Granted Patents)


Location History:

  • Sendai, JP (2017 - 2019)
  • Miyagi-gun, JP (2019)
  • Koshi, JP (2020)
  • Niigata, JP (2016 - 2021)
  • Miyagi, JP (2016 - 2024)

Company Filing History:


Years Active: 2016-2026

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Areas of Expertise:
Plasma Processing
Substrate Processing
Etching Method
Processing System
Magnetoresistance Effect
Magnetic Memory
Nozzle Cleaning
Cooling Structure
Gas Turbine Blade
Heat-Resistant Alloy
Combustor Cooling
Substrate Support
36 patents (USPTO):Explore Patents

Title: The Innovative Journey of Shinya Ishikawa

Introduction: Shinya Ishikawa, a pioneering inventor hailing from Miyagi, Japan, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Shinya Ishikawa's recent patents focus on advancements in renewable energy technologies, particularly in the field of solar power efficiency and storage solutions.

Career Highlights: With a career spanning over two decades, Ishikawa has established himself as a leading figure in the renewable energy sector, holding multiple patents that have revolutionized the industry.

Collaborations: Throughout his career, Shinya Ishikawa has collaborated with top research institutions and universities to further his research and bring his innovative ideas to life. His partnerships have led to the development of cutting-edge technologies that have had a lasting impact on the field.

Conclusion: Shinya Ishikawa's relentless pursuit of innovation and his passion for creating a more sustainable future have solidified his position as a visionary inventor in the realm of renewable energy. His work continues to inspire and shape the future of technology.

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