Shinya Ishikawa

USPTO Granted Patents = 29 (Patent Applications = 15)

EPO Patents = 1

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 29(Granted Patents)

Location History:

Sendai, JP (2017 - 2019)
Miyagi-gun, JP (2019)
Koshi, JP (2020)
Niigata, JP (2016 - 2021)
Miyagi, JP (2016 - 2024)

Company Filing History:

21 out of 10,295

Tokyo Electron Limited

Mitsubishi Hitachi Power Systems, Ltd.

patents

4. 2 out of 63

Tohoku Electric Power Company, Inc.

Mitsubishi Power, Ltd.

Himeji-ecotech Co., Ltd.

patent

where one patent can have more than one assignee

Years Active: 2016-2025

where 'Filed Patents' based on already Granted Patents

29 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12456628 - Substrate processing method and substrate processing apparatus (2025-10-28),

2. 12431335 - Substrate processing method and substrate processing apparatus (2025-09-30),

3. 12412750 - Plasma processing method and plasma processing apparatus (2025-09-09),

4. 12354837 - Plasma processing method and plasma processing apparatus (2025-07-08),

5. 12334343 - Substrate processing method and substrate processing system (2025-06-17),

6. 12112954 - Etching method, substrate processing apparatus, and substrate processing system (2024-10-08),

7. 12071687 - Plasma processing method and plasma processing apparatus (2024-08-27),

8. 11961755 - Substrate support and substrate processing apparatus (2024-04-16),

9. 11955337 - Substrate processing method and substrate processing system (2024-04-09),

10. 11690299 - Magnetoresistance effect element and magnetic memory (2023-06-27),

11. 11651971 - Etching method, substrate processing apparatus, and substrate processing system (2023-05-16),

12. 11488836 - Apparatus for substrate processing (2022-11-01),

13. 11476123 - Etching method, plasma processing apparatus, and substrate processing system (2022-10-18),

14. 11469111 - Substrate processing method and plasma processing apparatus (2022-10-11),

15. 11459655 - Plasma processing method and plasma processing apparatus (2022-10-04),

Title: The Innovative Journey of Shinya Ishikawa

Introduction: Shinya Ishikawa, a pioneering inventor hailing from Miyagi, Japan, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Shinya Ishikawa's recent patents focus on advancements in renewable energy technologies, particularly in the field of solar power efficiency and storage solutions.

Career Highlights: With a career spanning over two decades, Ishikawa has established himself as a leading figure in the renewable energy sector, holding multiple patents that have revolutionized the industry.

Collaborations: Throughout his career, Shinya Ishikawa has collaborated with top research institutions and universities to further his research and bring his innovative ideas to life. His partnerships have led to the development of cutting-edge technologies that have had a lasting impact on the field.

Conclusion: Shinya Ishikawa's relentless pursuit of innovation and his passion for creating a more sustainable future have solidified his position as a visionary inventor in the realm of renewable energy. His work continues to inspire and shape the future of technology.

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15 patents pending:

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1 patent (EPO):

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