The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Sep. 16, 2022
Tokyo Electron Limited, Tokyo, JP;
Shinya Ishikawa, Miyagi, JP;
Daiki Hariu, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma processing apparatus comprises a plasma processing chamber and a substrate support disposed in the plasma processing chamber. The substrate support includes a base, a ceramic member having a plurality of first vertical holes and a plurality of second vertical holes, at least one annular member, an electrostatic electrode layer, first and second central bias electrode layers, a plurality of first vertical connectors to surround the first vertical hole and to connect the first central bias electrode layer and the second central bias electrode layer, first and second annular bias electrode layers, a plurality of second vertical connectors to surround the second vertical hole and to connect the first annular bias electrode layer and the second annular bias electrode layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile