This inventor holds 3 USPTO granted patents and 3 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Daiki Hariu: Innovator in Plasma Processing Technology
Introduction
Daiki Hariu is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 3 patents. His work focuses on enhancing the efficiency and effectiveness of plasma processing apparatuses.
Latest Patents
Hariu's latest patents include a plasma processing apparatus and a substrate support designed for advanced manufacturing processes. The plasma processing apparatus features a chamber, a bias power supply, and a substrate support that holds both a substrate and an edge ring. This innovative design includes multiple bias electrodes and impedance adjusting mechanisms to optimize performance. Additionally, his substrate support is equipped with an electrostatic chuck that utilizes a dielectric material to enhance substrate attraction and stability during processing.
Career Highlights
Daiki Hariu is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His work at the company has allowed him to develop cutting-edge technologies that are crucial for modern manufacturing processes. His inventions have contributed to advancements in plasma processing, making him a key figure in this specialized field.
Collaborations
Hariu has collaborated with notable colleagues such as Shinya Ishikawa and Takahiko Sato. These partnerships have fostered innovation and have led to the development of new technologies in plasma processing.
Conclusion
Daiki Hariu's contributions to plasma processing technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to shape the future of semiconductor manufacturing.