Company Filing History:
Years Active: 2010-2015
Title: Shintaro Ueda: Innovator in Semiconductor Technology
Introduction
Shintaro Ueda is a prominent inventor based in Tama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His innovative approaches have advanced the methods used in the formation and treatment of low-k SiOCH films.
Latest Patents
Ueda's latest patents include a method for forming SiOCH film using organoaminosilane annealing. This method involves providing a low-k SiOCH film formed on a substrate by flowable CVD. It also includes exposing the low-k SiOCH film to a gas containing a Si—N bond in its molecule without applying electromagnetic energy to increase Si—O bonds and/or Si—C bonds in the film, followed by curing the low-k SiOCH film. Another notable patent is a method for filling recesses using pre-treatment with hydrocarbon-containing gas. This method treats the surfaces of the recesses of a substrate with reactive hydrocarbons generated from a pre-deposition gas without filling the recesses, and then deposits a flowable insulation film to fill the treated recesses.
Career Highlights
Throughout his career, Ueda has worked with notable companies such as ASM Japan K.K. and ASM IP Holding B.V. His experience in these organizations has allowed him to refine his expertise in semiconductor processes and materials.
Collaborations
Ueda has collaborated with several professionals in his field, including Akinori Nakano and Dai Ishikawa. These collaborations have contributed to the development of innovative technologies and methodologies in semiconductor manufacturing.
Conclusion
Shintaro Ueda's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in the field, showcasing the importance of innovation in technology.