The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2013
Filed:
Jan. 28, 2011
Applicant:
Shintaro Ueda, Tama, JP;
Inventor:
Shintaro Ueda, Tama, JP;
Assignee:
ASM Japan K.K., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/56 (2006.01); C23C 16/515 (2006.01);
U.S. Cl.
CPC ...
Abstract
A thin film is formed by alternating multiple times, respectively, a process of adsorbing a precursor onto a substrate and a process of treating the adsorbed surface using a reactant gas and a plasma, wherein the reactant gas is supplied substantially uniformly over the substrate, and the plasma is pulse-time-modulated and applied in the process of supplying the reactant gas.
Published as:
Ueda, Shintaro. (2013). Method of depositing film by atomic layer deposition with pulse-time-modulated plasma (U.S. Patent No. 8465811). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8465811
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile