Sendai, Japan

Shintaro Hinata


Average Co-Inventor Count = 5.8

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Miyagi, JP (2019)
  • Sendai, JP (2020 - 2021)

Company Filing History:


Years Active: 2019-2021

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4 patents (USPTO):Explore Patents

Title: Innovative Contributions of Shintaro Hinata in Magnetic Thin Film Technology

Introduction

Shintaro Hinata is a prominent inventor based in Sendai, Japan. He has made significant contributions to the field of magnetic thin film technology, with a total of four patents to his name. His work stands at the intersection of advanced materials science and practical applications, particularly in the production of sputtering targets for magnetic recording media.

Latest Patents

Hinata's latest patents reflect his expertise in the development of sputtering targets. One of his notable inventions is a sputtering target designed to form a magnetic thin film with a high coercive force (Hc). This innovative target consists of metallic cobalt (Co), metallic platinum (Pt), and an oxide that excludes metallic chromium (Cr) except for inevitable impurities. The oxide contains boroaluminate (BO) and comprises 10 to 50 vol % of the sputtering target.

Another significant patent involves a sputtering target specifically for magnetic recording media. This target can produce a magnetic thin film characterized by micronized magnetic crystal grains while maintaining optimal magnetic properties. The composition includes metallic Pt and an oxide, with Co ranging from 70 at % to 90 at % and Pt from 10 at % to 30 at % relative to the total metallic components. Additionally, the oxide constitutes 26 vol % to 40 vol % and features high-melting-point oxides with melting points between 1470°C and 2800°C.

Career Highlights

Throughout his career, Shintaro Hinata has been associated with esteemed institutions such as Tohoku University and Tanaka Kikinzoku Kogyo Co., Ltd. His work in these organizations has been pivotal in advancing research around sputtering technology and magnetic materials.

Collaborations

Hinata has collaborated with several notable professionals in his field, including Shin Saito and Kim Kong Tham. These partnerships have contributed to the development of his innovative technologies and have fostered a collaborative environment for advancing research in magnetics.

Conclusion

Shintaro Hinata's innovative work in sputtering targets is shaping the future of magnetic thin film applications. His patents provide valuable technical solutions that enhance the performance of magnetic recording media. As the field continues to evolve, Hinata's contributions will likely remain pivotal in driving further advancements and innovations.

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