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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11072851 B1

PDFFull Text
Date of Patent:
Jul. 27, 2021

Filed:

Nov. 15, 2016

Sputtering target

Applicants:

Tanaka Kikinzoku Kogyo K.k., Tokyo, JP;

Tohoku University, Sendai, JP;

Inventors:

Kim Kong Tham, Tsukuba, JP;

Ryousuke Kushibiki, Tsukuba, JP;

Toshiya Yamamoto, Tsukuba, JP;

Shin Saito, Sendai, JP;

Shintaro Hinata, Sendai, JP;

Assignees:

TANAKA KIKINZOKU KOGYO K.K., Tokyo, JP;

TOHOKU UNIVERSITY, Miyagi, JP;

Attorneys:

Orrick, Herrington & Sutcliffe

Joseph A. Calvaruso

K. Patrick Herman

Primary Examiner:

John J Brayton

Int. Cl.
CPC ...
C23C 14/34 (2006.01); C22C 5/04 (2006.01); C22C 1/10 (2006.01); H01J 37/34 (2006.01); C04B 35/01 (2006.01); C22C 19/07 (2006.01); G11B 5/851 (2006.01); C23C 14/06 (2006.01); C23C 14/18 (2006.01); C22C 1/05 (2006.01); C22C 1/04 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); C04B 35/01 (2013.01); C22C 1/1084 (2013.01); C22C 5/04 (2013.01); C22C 19/07 (2013.01); C23C 14/0688 (2013.01); C23C 14/18 (2013.01); G11B 5/851 (2013.01); H01J 37/3429 (2013.01); H01J 37/3491 (2013.01); B22F 2998/10 (2013.01); C04B 2235/3409 (2013.01); C04B 2235/405 (2013.01); C04B 2235/408 (2013.01); C22C 1/0441 (2013.01); C22C 1/0466 (2013.01); C22C 1/05 (2013.01); C22C 2202/02 (2013.01);
Abstract

Provided is a sputtering target with which it is possible to form a magnetic thin film having a high coercive force Hc. The sputtering target is a sputtering target that contains metallic Co, metallic Pt, and an oxide, wherein the sputtering target contains no metallic Cr except inevitable impurities, the oxide has BO, and the sputtering target comprises 10 to 50 vol % of the oxide.

Find Patent Forward Citations

Tham, Kim. (2021). Sputtering target (U.S. Patent No. 11072851). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11072851

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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