Tohoku University

Tanaka Kikinzoku Kogyo K.k.

Showa Denko K.k.

Shintaro Hinata

Shin Saito

Toshiya Yamamoto

Kim Kong Tham

Ryousuke Kushibiki

Migaku Takahashi

Tetsuya Kanbe

Lei Zhang

Kazuya Niwa

Takayuki Fukushima

Hisato Shibata

Takehiro Yamaguchi

Yuji Murakami

Tomoo Shige

Haruhisa Ohashi

Provided is a sputtering target with which it is possible to form a magnetic thin film having a high coercive force Hc. The sputtering target is a sputtering target that contains metallic Co, metallic Pt, and an oxide, wherein the sputtering target contains no metallic Cr except inevitable impurities, the oxide has BO, and the sputtering target comprises 10 to 50 vol % of the oxide.

Sputtering target

A sputtering target for magnetic recording media capable of producing a magnetic thin film in which the magnetic crystal grains are micronized and the distance between the centers of the grains is reduced while good magnetic properties are maintained. The target including metallic Pt and an oxide, with the balance being metallic Co and inevitable impurities, wherein the Co is contained in a range of 70 at % to 90 at % and the Pt is contained in a range of 10 at % to 30 at % relative to a total of metallic components in the sputtering target for magnetic recording media, the oxide is contained in a range of 26 vol % to 40 vol % relative to a total volume of the sputtering target for magnetic recording media, and the oxide is composed of BOand one or more high-melting-point oxides having a melting point of 1470&#xb0; C. or higher and 2800&#xb0; C. or lower.

Sputtering target for magnetic recording media

Provided is a sputtering target with which it is possible to form a magnetic thin film having a high coercive force Hc and a process for production thereof. The sputtering target is a sputtering target comprising metallic Co, metallic Pt, and an oxide, wherein the sputtering target does not contain metallic Cr, and the oxide is WOand wherein the sputtering target comprises 25 to 50 at % of metallic Co relative to a total of metallic Co and metallic Pt.

Sputtering target and process for production thereof

A magnetic recording medium includes a substrate, a barrier layer, a crystal grain size control layer, and a magnetic layer that are arranged in this order. The barrier layer includes at least one of oxides, nitrides, and carbides, and the crystal grain size control layer is a crystalline layer including Ag and having an average thickness in a range of 0.1 nm to 1 nm. The barrier layer makes contact with the crystal grain size control layer, and the magnetic layer includes an alloy having a L1crystal structure and a (001) face orientation.

Magnetic recording medium and magnetic storage apparatus

Growing community of inventors

Sendai, Japan

Shintaro Hinata