The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2021
Filed:
Oct. 11, 2017
Tanaka Kikinzoku Kogyo K.k., Tokyo, JP;
Tohoku University, Sendai, JP;
Kim Kong Tham, Tsukuba, JP;
Ryousuke Kushibiki, Tsukuba, JP;
Toshiya Yamamoto, Tsukuba, JP;
Shin Saito, Sendai, JP;
Shintaro Hinata, Sendai, JP;
TANAKA KIKINZOKU KOGYO K.K., Tokyo, JP;
TOHOKU UNIVERSITY, Sendai, JP;
Abstract
A sputtering target for magnetic recording media capable of producing a magnetic thin film in which the magnetic crystal grains are micronized and the distance between the centers of the grains is reduced while good magnetic properties are maintained. The target including metallic Pt and an oxide, with the balance being metallic Co and inevitable impurities, wherein the Co is contained in a range of 70 at % to 90 at % and the Pt is contained in a range of 10 at % to 30 at % relative to a total of metallic components in the sputtering target for magnetic recording media, the oxide is contained in a range of 26 vol % to 40 vol % relative to a total volume of the sputtering target for magnetic recording media, and the oxide is composed of BOand one or more high-melting-point oxides having a melting point of 1470° C. or higher and 2800° C. or lower.