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Years Active: 2006-2019
Title: The Innovations of Shinro Ohta
Introduction
Shinro Ohta is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor processing and polishing technologies. With a total of 6 patents, Ohta's work has had a substantial impact on the industry.
Latest Patents
Ohta's latest patents include a processing end point detection method, a polishing method, and a polishing apparatus. The processing end point detection method is designed to detect the timing of a processing end point, such as polishing stop or changes in polishing conditions. This method involves producing a spectral waveform that indicates the relationship between reflection intensities and wavelengths at a processing end point. By using a reference workpiece or simulation calculation, the method selects wavelengths of local maximum and minimum values of reflection intensities. It calculates a characteristic value of the surface to be processed and sets a distinctive point of time variation of this characteristic value as the processing end point. The polishing apparatus is utilized for polishing and planarizing substrates, such as semiconductor wafers, on which conductive films are formed. This apparatus includes a polishing table, a motor for rotation, a top ring for holding the substrate, a film thickness measuring sensor, and a computing device for processing signals from the sensor.
Career Highlights
Throughout his career, Shinro Ohta has worked with notable companies, including Ebara Corporation and Toshiba Corporation. His expertise in polishing technologies has made him a valuable asset in the semiconductor industry.
Collaborations
Ohta has collaborated with several professionals in his field, including Yoichi Kobayashi and Shunsuke Nakai. These collaborations have further enhanced his innovative contributions to technology.
Conclusion
Shinro Ohta's work in the field of semiconductor processing and polishing technologies showcases his innovative spirit and dedication to advancing the industry. His patents reflect a deep understanding of the complexities involved in these processes, making him a key figure in the realm of invention.