The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 25, 2006

Filed:

Jun. 12, 2002
Applicants:

Shinro Ohta, Tokyo, JP;

Kazuo Shimizu, Tokyo, JP;

Inventors:

Shinro Ohta, Tokyo, JP;

Kazuo Shimizu, Tokyo, JP;

Assignee:

Ebara Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01); B24D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polishing pad () has an upper-layer pad () having a hole () defined therein, a light-transmittable window () disposed in the hole () for allowing light to pass therethrough, and a lower-layer pad () disposed below the upper-layer pad () and having a light passage hole () defined therein which has substantially the same diameter as the hole () in the upper-layer pad (). A transparent film () with an adhesive agent applied to upper and lower surfaces thereof is interposed between the upper-layer pad () and the lower-layer pad (). The hole () defined in the upper-layer pad () and the light passage hole () defined in the lower-layer pad () have substantially the same size as each other.


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