Inventors with similar research interests:
Location History:
- Shinagawa-ku, Tokyo, JP (1994)
- Kanagawa, JP (1987 - 2005)
Company Filing History:
49 out of 58,131 
2 out of 832,891 Years Active: 1987-2005
Areas of Expertise:
Title: Shingo Kadomura: Innovator in Advanced Etching and Composite Material Technologies
Introduction
Shingo Kadomura, a prolific inventor based in Kanagawa, Japan, has made significant contributions to the fields of semiconductor processing and material science. With a remarkable portfolio of 51 patents, Kadomura has established himself as a key player in driving innovations that enhance manufacturing processes and material properties.
Latest Patents
Among his latest groundbreaking inventions are two notable patents:
1. **Method of Etching Insulating Film** - This invention presents a rapid etching technique for insulating films, especially organic-based dielectric films, without causing damage or decreasing throughput. The method involves forming an insulating film, creating a patterned mask layer, and utilizing specific ions or radicals generated from mixed gases to effectively etch the insulating layer and create openings while producing reaction products containing CN groups.
2. **Aluminum Nitride/Aluminum Base Composite Material and a Method for Producing thereof** - This patent describes a method for producing a composite material that combines aluminum nitride powder with a molten aluminum base. The process includes pressurizing the aluminum nitride in a container, pouring molten aluminum into it, and applying pressure to ensure the aluminum fills the voids between the aluminum nitride particles, resulting in a high-performance composite.
Career Highlights
Shingo Kadomura has had a noteworthy career, contributing his expertise to leading companies, including Sony Corporation. His work focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing techniques, which are crucial in today’s technology landscape.
Collaborations
Throughout his career, Kadomura has collaborated with talented professionals such as Shinsuke Hirano and Kei Takatsu. These partnerships reflect his commitment to innovation and the development of advanced technologies in materials and etching processes.
Conclusion
Shingo Kadomura’s dedication to innovation and his extensive patent portfolio reflect his vital role in advancing technology. His contributions not only impact semiconductor processing but also offer new avenues for material applications, highlighting the importance of continuous research and development in the tech industry.