Kariya, Japan

Shin Takizawa

This inventor holds 5 USPTO granted patents. Top assignees: Denso Corporation, Denso Corpora Tion. Active years: 2020-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shin Takizawa. Retrieved from https://idiyas.com/inventor/shin-takizawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020-2025

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5 patents (USPTO):Explore Patents

Title: The Innovations of Shin Takizawa

Introduction

Shin Takizawa is a notable inventor based in Kariya, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on enhancing the efficiency and functionality of semiconductor devices.

Latest Patents

One of Takizawa's latest patents is a semiconductor device that includes a cell portion and a peripheral portion. The cell portion features a semiconductor element with a drift layer, a first impurity region, a second impurity region, trench-gate structures, a high-concentration layer, an interlayer insulating film, a first electrode, and a second electrode. The interlayer insulating film is strategically placed on the trench-gate structures, the first impurity region, and the second impurity region, incorporating a first contact hole that connects with both impurity regions. The peripheral portion has a section facing the cell portion, and the interlayer insulating film also includes a second contact hole at this section, exposing the first impurity region. This design allows the first electrode to be electrically connected to the first impurity region through the second contact hole in the peripheral portion.

Another significant patent involves a semiconductor device that features a capacitor on a substrate. In this design, a wiring layer is arranged by stacking a first insulation film, a lower electrode, a second insulation film, an intermediate electrode, a third insulation film, and an upper electrode in sequence. The capacitor consists of a first capacitor formed by the lower electrode and the intermediate electrode, and a second capacitor formed by the intermediate electrode and the upper electrode. These capacitors are connected in parallel, with the intermediate electrode maintaining a higher potential than both the lower and upper electrodes.

Career Highlights

Shin Takizawa has worked with prominent companies in the industry, including Denso Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in semiconductor technology.

Collaborations

Throughout his career, Takizawa has collaborated with talented individuals such as Yusuke Nonaka and Shinichirou Yanagi. These partnerships have fostered a creative environment that has led to the development of advanced technologies.

Conclusion

Shin Takizawa's contributions to semiconductor technology are noteworthy, with several patents that enhance device functionality and efficiency. His work continues to influence the

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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