Company Filing History:
Years Active: 1999-2005
Title: Shimao Yoneyama: Innovator in Plasma Processing Technologies
Introduction
Shimao Yoneyama is a notable inventor based in Yamanashi, Japan, recognized for his significant contributions to plasma processing technologies. With a total of two patents under his name, Yoneyama's work has advanced manufacturing processes that utilize plasma discharges.
Latest Patents
Yoneyama's most recent patents include a groundbreaking process that depends on plasma discharges sustained by inductive coupling. The first patent involves a method for fabricating a product, which integrates a composition of entities, with at least one entity originating from a species produced by a gaseous discharge activated by a high-frequency field. This innovative process allows for selective maintenance of the vector sum of currents to phase and inverse-phase capacitive coupled voltages.
His second patent further defines a high-frequency plasma process wherein the plasma execution is also based on a composition of entities emanating from a plasma activated by an inductive coupling structure. This method emphasizes the balance of phase and anti-phase capacitive currents into the plasma, essential for efficient fabrication processes.
Career Highlights
Throughout his career, Shimao Yoneyama has worked at prominent companies, including MCElectronics Co., Ltd. and Hitachi Kokusai Electric Co., Ltd. His experience in these innovative environments has greatly influenced his approach to plasma processing and fabrication techniques.
Collaborations
Yoneyama has collaborated with distinguished colleagues and experts in the field, including Georgy Vinogradov and Daniel L. Flamm. These partnerships have facilitated the exchange of ideas and advancements, further contributing to his successful inventions.
Conclusion
Shimao Yoneyama's inventive works highlight the importance of plasma processing technologies in modern manufacturing. His patents not only showcase his technical expertise but also his dedication to advancing industrial applications. As innovations in this field continue to evolve, Yoneyama's contributions will undoubtedly play a vital role in shaping future technologies.