The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 1999
Filed:
Oct. 28, 1996
Applicant:
Inventors:
Georgy Vinogradov, Yamanashi, JP;
Shimao Yoneyama, Yamanashi, JP;
Assignee:
MC Electronics Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H / ;
U.S. Cl.
CPC ...
216 68 ; 156345 ; 1187 / ; 1187 / ; 31511121 ;
Abstract
A process for fabricating a product including the steps of subjecting a substrate to a composition of entities, at least one of the entities emanating from a species generated by a plasma excited by a high frequency field provided by an inductive coupling structure in which the phase and anti-phase capacitive currents into the plasma are substantially balanced.
Vinogradov, Georgy. (1999). High frequency plasma process wherein the plasma is executed by an (U.S. Patent No. 5965034). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5965034
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile