Chaozhou, China

Shih-Ya Lin


Average Co-Inventor Count = 5.4

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Pingtung County, TW (2019)
  • Chaozhou Township, TW (2021 - 2023)

Company Filing History:


Years Active: 2019-2024

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5 patents (USPTO):

Title: The Innovations of Shih-Ya Lin: A Semiconductor Pioneer

Introduction

Shih-Ya Lin, an accomplished inventor based in Chaozhou, China, has made significant contributions to the field of semiconductor technology. With a portfolio of five patents, Lin's innovations focus on advanced device structures that improve semiconductor performance and efficiency. His work embodies the spirit of innovation within the rapidly evolving tech landscape.

Latest Patents

Among his latest patents is the "Germanium tin gate-all-around device," which describes a sophisticated semiconductor device that integrates a substrate and a buffer layer adorned with a stacked fin structure. This innovative setup incorporates germanium to enhance functionality, coupled with a semiconductor layer composed of germanium and tin. Another noteworthy patent, titled "Semiconductor device and manufacturing method thereof," elaborates on a device that features layers of varying semiconductor materials, utilizing an alloy that includes tin. These advancements promise to revolutionize semiconductor designs and manufacturing processes.

Career Highlights

Shih-Ya Lin honed his expertise while working at renowned organizations such as Taiwan Semiconductor Manufacturing Company Limited and National Taiwan University. His experience in these esteemed institutions has laid the groundwork for substantial technological developments in semiconductors.

Collaborations

Throughout his career, Lin has collaborated with other distinguished professionals in the field, including Fang-Liang Lu and I-Hsieh Wong. These partnerships reflect a commitment to collective innovation and the pursuit of cutting-edge solutions in semiconductor technology.

Conclusion

Shih-Ya Lin's work stands as a testament to the impact of pioneering inventors in the semiconductor industry. His patents not only highlight innovative design concepts but also contribute to the ongoing advancements within the field. As technology continues to evolve, inventors like Lin will play a crucial role in shaping the future of semiconductor development.

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