Hsinchu, Taiwan

Shih-Kai Fan


Average Co-Inventor Count = 5.5

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2017-2021

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4 patents (USPTO):Explore Patents

Title: Shih-Kai Fan: Innovator in Semiconductor Technology

Introduction

Shih-Kai Fan is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on methods that enhance the efficiency and effectiveness of semiconductor structures.

Latest Patents

One of his latest patents is titled "Method of forming shallow trench isolation structure." This innovative method involves depositing a mask layer over a substrate and etching the substrate to define a first opening. The process includes depositing a sacrificial material in the first opening and applying a dielectric liner along the sidewalls. After removing the sacrificial material, the substrate is etched again to enlarge the opening, leading to the formation of a second opening. This second opening has distinct portions that extend in different directions, ultimately filled with dielectric material. Another patent, "Shallow trench isolation structure and method of forming the same," describes a semiconductor structure that includes a shallow trench isolation (STI) structure, which is crucial for modern semiconductor devices.

Career Highlights

Shih-Kai Fan is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work at this company has allowed him to develop and refine his innovative techniques, contributing to advancements in semiconductor manufacturing.

Collaborations

Throughout his career, Shih-Kai Fan has collaborated with notable colleagues, including Cheng-Chieh Lai and Kuang-Hsin Chen. These collaborations have fostered a creative environment that encourages the exchange of ideas and technological advancements.

Conclusion

Shih-Kai Fan's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor manufacturing.

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