Company Filing History:
Years Active: 2016-2023
Title: Innovations of Shih-Hsien Chen
Introduction
Shih-Hsien Chen is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of manufacturing, particularly in the development of die seal rings. With a total of four patents to his name, Chen's work showcases his expertise and innovative spirit.
Latest Patents
Chen's latest patents include a method of manufacturing a die seal ring. This method involves several steps, including the formation of a dielectric layer on a substrate. Conductive layers are then stacked on the substrate within the dielectric layer. Each conductive layer consists of a first conductive portion and a second conductive portion, with the second portion placed atop the first. Notably, the width of the first conductive portion is smaller than that of the second. The design incorporates air gaps between the conductive portions and the dielectric layer, which are crucial for preventing cracks during the die sawing process. Additionally, his patent for the die seal ring itself outlines its structure, which includes a substrate, dielectric layer, and conductive layers, all working together to enhance durability and performance.
Career Highlights
Throughout his career, Shih-Hsien Chen has worked with prominent companies such as United Microelectronics Corporation and Radiant Opto-electronics (Suzhou) Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects.
Collaborations
Chen has collaborated with several professionals in his field, including Chih-Sheng Chang and Shih-Che Huang. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Shih-Hsien Chen's contributions to the field of manufacturing, particularly through his patents on die seal rings, highlight his innovative capabilities. His work not only addresses current challenges in the industry but also sets the stage for future advancements.