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For the Inventor, By the Inventor

Kokubunji, Japan

Shigeru Nishimatsu

USPTO Granted Patents = 26

Average Co-Inventor Count = 4.0

ph-index = 17

Forward Citations = 1,223(Granted Patents)


Location History:

  • Kokubunji, JA (1977)
  • Kokubunji, JP (1981 - 1993)

Company Filing History:

goldMedal26 out of 42,485 
 
Hitachi, Ltd.
 patents

Years Active: 1977-1993

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26 patents (USPTO):Explore Patents
1. 5220169 - Surface analyzing method and apparatus (1993-06-15),
2. 5140272 - Method of semiconductor surface measurment and an apparatus for (1992-08-18),
3. 5138158 - Surface analysis method and apparatus (1992-08-11),
4. 5108778 - Surface treatment method (1992-04-28),
5. 5108543 - Method of surface treatment (1992-04-28),
6. 5028778 - Surface analysis method and a device therefor (1991-07-02),
7. 4901667 - Surface treatment apparatus (1990-02-20),
8. 4886571 - Surface treatment and apparatus therefor (1989-12-12),
9. 4828874 - Laser surface treatment method and apparatus for practicing same (1989-05-09),
10. 4705595 - Method for microwave plasma processing (1987-11-10),
11. 4624214 - Dry-processing apparatus (1986-11-25),
12. 4609426 - Method and apparatus for monitoring etching (1986-09-02),
13. 4579623 - Method and apparatus for surface treatment by plasma (1986-04-01),
14. 4559100 - Microwave plasma etching apparatus (1985-12-17),
15. 4522674 - Surface treatment apparatus (1985-06-11),

Title: Innovator Spotlight: Shigeru Nishimatsu

Introduction

Shigeru Nishimatsu is an accomplished inventor based in Kokubunji, Japan. With an impressive portfolio of 26 patents, he has made significant contributions to the field of semiconductor technology and surface analysis.

Latest Patents

Among his latest innovations is a patent for a surface analyzing method and apparatus. This technology employs a first beam of light with a wavelength ranging from soft X-ray to vacuum ultraviolet regions, which is focused into a thin beam directed at a specimen's surface. The physical information obtained from this irradiation allows for detailed surface analysis. Additionally, he has developed a method for semiconductor surface measurement, designed to evaluate the electrical characteristics of a semiconductor body. This method features an electrode with a flat surface that is positioned very close to the semiconductor substrate, specifically at a gap smaller than 0.5 µm, enhancing measurement precision.

Career Highlights

Shigeru Nishimatsu works for Hitachi, Ltd., a leading company in technological innovation. His role at Hitachi has been pivotal in the advancement of semiconductor technology and surface measurement techniques, underscoring his expertise and importance in the field.

Collaborations

Throughout his career, Nishimatsu has collaborated with notable colleagues, including Keizo Suzuki and Ken Ninomiya. Their joint efforts have contributed to various projects, further enhancing the innovation landscape in which they operate.

Conclusion

Shigeru Nishimatsu's dedication to innovation is evident in his extensive patent portfolio and his role at Hitachi, Ltd. His contributions to surface analysis and semiconductor technology continue to shape the industry, showcasing the impact of his work on future advancements.

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