This inventor holds 11 USPTO granted patents and 3 EPO patents. Top assignees: Nissan Chemical Industries Limited, The University of Toyama. Active years: 2009-2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
11 out of 1,235 
1 out of 38 
Years Active: 2009-2019
Title: Shigeo Kimura: Innovator in Lithography and Material Science
Introduction
Shigeo Kimura is a prominent inventor based in Toyama, Japan. He has made significant contributions to the fields of lithography and material science, holding a total of 11 patents. His innovative work focuses on developing advanced materials and compositions that enhance semiconductor manufacturing processes.
Latest Patents
One of Kimura's latest patents is a cationically polymerizable resist underlayer film-forming composition. This composition is designed for lithography, serving as an underlayer anti-reflective coating that reduces light reflection during exposure from a semiconductor substrate to the photoresist layer. It is particularly effective as a flattening film for semiconductor substrates with recesses and projections. The composition includes an alicyclic epoxy compound, a thermal acid generator, and a solvent.
Another notable patent involves a light-degradable material, substrate, and method for patterning the substrate. This new material allows for the formation of finer patterns and can be applied to control the adsorption and adhesion of various cell species, proteins, and viruses. The light-degradable material features a moiety that bonds to a substrate surface through a siloxane bond, along with specific structural units that enhance its functionality.
Career Highlights
Throughout his career, Shigeo Kimura has worked with notable organizations, including Nissan Chemical Industries Limited and the University of Toyama. His work in these institutions has allowed him to collaborate on various innovative projects that push the boundaries of material science and semiconductor technology.
Collaborations
Kimura has collaborated with talented individuals such as Takahiro Kishioka and Yuki Usui. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Shigeo Kimura's contributions to lithography and material science have established him as a key figure in the field. His innovative patents and collaborations continue to influence the development of advanced materials for semiconductor manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile