The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2014
Filed:
Jun. 17, 2010
Shigeo Kimura, Toyama, JP;
Hirokazu Nishimaki, Toyama, JP;
Tomoya Ohashi, Toyama, JP;
Yuki Usui, Toyama, JP;
Takahiro Kishioka, Toyama, JP;
Shigeo Kimura, Toyama, JP;
Hirokazu Nishimaki, Toyama, JP;
Tomoya Ohashi, Toyama, JP;
Yuki Usui, Toyama, JP;
Takahiro Kishioka, Toyama, JP;
Nissan Chemical Industries, Ltd., Tokyo, JP;
Abstract
A resist underlayer film forming composition used in a lithography process includes: a polymer (A) containing a unit structure having a hydroxy group, a unit structure having a carboxy group, or combination thereof; a crosslinkable compound (B) having at least two vinyl ether groups; a photoacid generator (C); a Cfluoroalkylcarboxylic acid or a salt of the fluoroalkylcarboxylic acid (D); and a solvent (E). The polymer (A) includes a unit structure selected from unit structures of Formula (1), Formula (2), and Formula (3);