This inventor holds 13 USPTO granted patents and 1 EPO patent, primarily in Sputtering Technology. Top assignees: Canon Anelva Corporation, Hoya Corporation. Active years: 2006-2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Yamanashi, JP (2006 - 2009)
- Kawasaki, JP (2012)
- Yokohama, JP (2015 - 2017)
- Tokyo, JP (2016 - 2020)
Company Filing History:
Years Active: 2006-2020
Areas of Expertise:
Title: Shigenori Ishihara: Innovator in Sputtering Technology
Introduction
Shigenori Ishihara is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of sputtering technology, holding a total of 13 patents. His innovative designs have advanced the capabilities of substrate processing apparatuses, making him a notable figure in the industry.
Latest Patents
Ishihara's latest patents include a sputtering apparatus and a substrate processing apparatus. The first patent describes a sputtering apparatus that features a shutter unit, multiple target holders, and a substrate holder capable of rotating about an axis perpendicular to the substrate's surface. This design incorporates a first shutter with two apertures and a second shutter with two additional apertures. The target holders are arranged on a virtual circle, with varying intervals between them to enhance functionality.
The second patent also focuses on a sputtering apparatus, which includes a chamber, a substrate holder, and a shutter unit, among other components. In this design, the target holders are positioned at the vertices of a virtual rectangle inscribed in a circle, optimizing the arrangement for efficient substrate processing.
Career Highlights
Throughout his career, Shigenori Ishihara has worked with notable companies such as Canon Anelva Corporation and Hoya Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the field of sputtering.
Collaborations
Ishihara has collaborated with esteemed colleagues, including Toshiyuki Suzuki and Hiroyuki Toya. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Shigenori Ishihara's contributions to sputtering technology and his impressive portfolio of patents underscore his role as a leading inventor in the field. His work continues to influence advancements in substrate processing, showcasing the importance of innovation in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile