The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2018
Filed:
May. 28, 2015
Canon Anelva Corporation, Kawasaki-shi, Kanagawa-ken, JP;
Shigenori Ishihara, Tokyo, JP;
Kazuya Konaga, Kawasaki, JP;
Hiroyuki Toya, Hachioji, JP;
Shintaro Suda, Kawasaki, JP;
Yasushi Yasumatsu, Inagi, JP;
Yuu Fujimoto, Hino, JP;
Toshikazu Nakazawa, Saitama, JP;
Eiji Nakamura, Machida, JP;
Shin Imai, Kawasaki, JP;
CANON ANELVA CORPORATION, Kawasaki-shi, Kanagawa-ken, JP;
Abstract
A sputtering apparatus includes a chamber, a substrate holder, first to fourth target holders, a shutter unit, and a gate valve through which the substrate is conveyed. The first to fourth target holders are arranged on vertices of a virtual rectangle having long sides and short sides and inscribed in a virtual circle centered on the axis, the first target holder and the second target holder are respectively arranged on two vertices defining one short side of the virtual rectangle, and a distance to the gate valve is shorter than distances from the third target holder and the fourth target holder to the gate valve.