Kawasaki, Japan

Shintaro Suda


Average Co-Inventor Count = 8.3

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2018-2020

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3 patents (USPTO):

Title: The Innovative Contributions of Shintaro Suda

Introduction

Shintaro Suda is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of sputtering technology, holding three patents that showcase his expertise and innovative spirit. His work primarily focuses on enhancing substrate processing apparatuses, which are crucial in various manufacturing processes.

Latest Patents

One of Shintaro Suda's latest patents is a sputtering apparatus that includes a shutter unit, multiple target holders, and a substrate holder capable of rotating about an axis perpendicular to the substrate's surface. This design features a first shutter with two apertures and a second shutter with two additional apertures. The arrangement of target holders on a virtual circle allows for flexibility in processing, with varying intervals between the holders. Another patent involves a sputtering apparatus that comprises a chamber, a substrate holder, and a shutter unit, among other components. This design optimizes the arrangement of target holders in a virtual rectangle, improving the efficiency of substrate conveyance through a gate valve.

Career Highlights

Shintaro Suda is currently employed at Canon Anelva Corporation, where he continues to develop innovative technologies in the field of sputtering. His work has been instrumental in advancing the capabilities of substrate processing, making significant impacts in various applications.

Collaborations

Shintaro has collaborated with esteemed colleagues such as Shigenori Ishihara and Hiroyuki Toya. Their combined expertise has contributed to the successful development of advanced sputtering technologies.

Conclusion

Shintaro Suda's contributions to sputtering technology exemplify his innovative mindset and dedication to advancing manufacturing processes. His patents reflect a deep understanding of the complexities involved in substrate processing, positioning him as a key figure in his field.

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