The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2020
Filed:
May. 11, 2018
Canon Anelva Corporation, Kawasaki-shi, Kanagawa-ken, JP;
Shigenori Ishihara, Tokyo, JP;
Hiroyuki Toya, Hachioji, JP;
Yasushi Yasumatsu, Inagi, JP;
Toshikazu Nakazawa, Saitama, JP;
Eiji Nakamura, Machida, JP;
Shintaro Suda, Kawasaki, JP;
Shin Imai, Kawasaki, JP;
Yuu Fujimoto, Hino, JP;
CANON ANELVA CORPORATION, Kawasaki-Shi, Kanagawa-Ken, JP;
Abstract
A sputtering apparatus includes a shutter unit, a plurality of target holders, and a substrate holder which can rotate about an axis perpendicular to a surface on which a substrate is held. The shutter unit includes a first shutter having first and second apertures and a second shutter having third and fourth apertures. The plurality of target holders are arranged on a first virtual circle centered on the axis, with the arrangement intervals between the plurality of target holders on the first virtual circle including at least two types of arrangement intervals.