Eiji Nakamura

Title: Eiji Nakamura: Innovator in Sputtering Technology

Introduction

Eiji Nakamura is a prominent inventor based in Machida, Japan. He has made significant contributions to the field of sputtering technology, holding three patents that showcase his innovative approach to substrate processing.

Latest Patents

Nakamura's latest patents include advanced sputtering apparatuses designed to enhance substrate processing efficiency. One of his notable inventions features a sputtering apparatus that incorporates a shutter unit, multiple target holders, and a substrate holder capable of rotating about an axis perpendicular to the substrate's surface. This design includes a first shutter with two apertures and a second shutter with additional apertures, allowing for versatile operation. Another patent describes a sputtering apparatus with a chamber, a substrate holder, and a shutter unit, where the target holders are strategically arranged on the vertices of a virtual rectangle inscribed in a circle. This configuration optimizes the distance to the gate valve, improving the overall functionality of the apparatus.

Career Highlights

Eiji Nakamura has built a successful career at Canon Anelva Corporation, where he has been instrumental in developing cutting-edge sputtering technologies. His work has not only advanced the capabilities of substrate processing but has also contributed to the broader field of materials science.

Collaborations

Throughout his career, Nakamura has collaborated with esteemed colleagues such as Shigenori Ishihara and Hiroyuki Toya. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Eiji Nakamura's contributions to sputtering technology exemplify his dedication to innovation and excellence in the field. His patents reflect a deep understanding of substrate processing, positioning him as a key figure in advancing this technology.