Yuu Fujimoto

Title: Yuu Fujimoto: Innovator in Sputtering Technology

Introduction

Yuu Fujimoto is a notable inventor based in Hino, Japan, recognized for his contributions to sputtering technology. With a total of three patents to his name, Fujimoto has made significant advancements in the field of substrate processing.

Latest Patents

Fujimoto's latest patents include innovative designs for sputtering apparatuses. One of his patents describes a sputtering apparatus that features a shutter unit, multiple target holders, and a substrate holder capable of rotating about an axis perpendicular to the substrate's surface. This design incorporates a first shutter with two apertures and a second shutter with additional apertures, enhancing the efficiency of the sputtering process. Another patent outlines a sputtering apparatus that includes a chamber, a substrate holder, and a shutter unit, with target holders arranged in a virtual rectangle inscribed in a circle. This configuration optimizes the distance from the target holders to the gate valve, improving the overall functionality of the apparatus.

Career Highlights

Fujimoto is currently employed at Canon Anelva Corporation, where he continues to develop cutting-edge technologies in sputtering and substrate processing. His work has positioned him as a key figure in the advancement of manufacturing processes in the semiconductor industry.

Collaborations

Throughout his career, Fujimoto has collaborated with esteemed colleagues such as Shigenori Ishihara and Hiroyuki Toya. These partnerships have fostered innovation and contributed to the successful development of new technologies.

Conclusion

Yuu Fujimoto's contributions to sputtering technology and substrate processing have established him as a prominent inventor in his field. His innovative patents and collaborations reflect his commitment to advancing technology in the semiconductor industry.