Saitama, Japan

Toshikazu Nakazawa


Average Co-Inventor Count = 4.1

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Kawasaki, JP (2015 - 2017)
  • Saitama, JP (2015 - 2020)

Company Filing History:


Years Active: 2015-2020

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8 patents (USPTO):

Title: **Innovative Contributions of Toshikazu Nakazawa in Sputtering Technology**

Introduction

Toshikazu Nakazawa, an accomplished inventor based in Saitama, Japan, has made significant contributions to the field of sputtering technology. With a total of eight patents to his name, his innovations continue to impact various applications in the semiconductor industry.

Latest Patents

Among Nakazawa's notable inventions are two advanced sputtering apparatuses designed to enhance substrate processing. The first apparatus includes a shutter unit, multiple target holders, and a substrate holder capable of rotation about an axis perpendicular to the surface holding the substrate. This design features a first shutter with two apertures and a second shutter with additional apertures, optimizing the sputtering process.

The second apparatus presents a chamber setup with a substrate holder, four target holders, a shutter unit, and a gate valve for substrate conveyance. The arrangement of target holders forms a virtual rectangle inscribed in a circle, where strategic positioning enhances functionality. Notably, the first and second target holders are positioned at the two vertices defining one short side of the virtual rectangle, allowing for more effective material deposition.

Career Highlights

Toshikazu Nakazawa currently works at Canon Anelva Corporation, where he continues to develop innovative technologies in sputtering applications. His extensive research and development efforts have consistently positioned him as a leader in his field, driving advancements that meet the growing demands of the semiconductor industry.

Collaborations

Collaboration is key to Nakazawa's success, and he has worked alongside dedicated colleagues such as Shigenori Ishihara and Hiroyuki Toya. Together, they have explored the complexities of sputtering technology, sharing insights and expertise to push the boundaries of what is possible in substrate processing.

Conclusion

In conclusion, Toshikazu Nakazawa's innovative spirit and technical prowess have led to groundbreaking developments in sputtering technology. His patents represent not only personal achievement but also contribute to the broader advancements within the semiconductor industry. As he continues his work at Canon Anelva Corporation, the impact of his inventions will surely be felt for years to come.

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