The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2012
Filed:
Jan. 31, 2011
Takashi Minami, Kawasaki, JP;
Shigenori Ishihara, Kawasaki, JP;
Takashi Minami, Kawasaki, JP;
Shigenori Ishihara, Kawasaki, JP;
Canon Anelva Corporation, Kawasaki-shi, JP;
Abstract
The present invention provides a plasma treatment apparatus and a conditioning method capable of performing a conditioning for the whole vacuum chamber. A plasma treatment apparatus according to an embodiment of the present invention is provided with a moving means for moving a substrate holder () between a reaction chamber () and a transfer chamber () lying on the under side thereof. Moreover, it has such structure that the exhaust conductance of the reaction chamber () becomes large when the substrate holder () lies in the transfer chamber. Upon the conditioning, the substrate holder () is moved to the transfer chamber () to allow diffusing species to spread widely, thereby effectively performing the conditioning for both reaction chamber () and transfer chamber () in the vacuum chamber ().