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For the Inventor, By the Inventor

Osaka, Japan

Shigeki Amadatsu

This inventor holds 10 USPTO granted patents and 2 published patent applications. Top assignee: Daihen Corporation. Active years: 1998-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shigeki Amadatsu. Retrieved from https://idiyas.com/inventor/shigeki-amadatsu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10 

% Patents Active = 70.0

Average Co-Inventor Count = 3.6

ph-index = 4

Forward Citations = 79(Granted Patents)


Location History:

  • Ibaraki, JP (1998)
  • Hyogo, JP (2002 - 2004)
  • Osaka, JP (2009 - 2020)

Company Filing History:

goldMedal10 out of 359 
 
Daihen Corporation
 patents

Years Active: 1998-2026

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10 patents (USPTO):Explore Patents
1. 12626891 - Plasma processing apparatus (2026-05-12),
2. 10755898 - Plasma generating device (2020-08-25),
3. 10306744 - Plasma generation apparatus and high-frequency power source (2019-05-28),
4. 10014162 - Plasma generation apparatus for generating toroidal plasma (2018-07-03),
5. 8710824 - Voltage detector having voltage detection printed board (2014-04-29),
6. 7714594 - Current detection printed board, voltage detection printed board, and current/voltage detector using same, and current detector and voltage detector (2010-05-11),
7. 7489145 - Plasma processing system (2009-02-10),
8. 6726803 - Multi-sectional plasma generator with discharge gaps between multiple elements forming a plasma discharge cavity (2004-04-27),
9. 6401653 - Microwave plasma generator (2002-06-11),
10. 5843236 - Plasma processing apparatus for radiating microwave from rectangular (1998-12-01),

Title: Shigeki Amadatsu: Innovator in Plasma Technology

Introduction

Shigeki Amadatsu is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of plasma technology, holding a total of 10 patents. His work focuses on developing advanced plasma generating devices and systems that have applications in various industries.

Latest Patents

One of his latest inventions is a plasma generating device that utilizes an inductively coupled plasma system. This device features an antenna coil that generates plasma within a vacuum chamber. It is equipped with a high-frequency power source that connects to a reference potential for plasma potential, applying high-frequency voltage to the antenna coil. The device also includes a resonance circuit that is symmetrically configured on both sides, enhancing its efficiency. Another notable patent is a plasma generation apparatus that comprises a chamber with a toroidal-shaped electric discharge space, a high-frequency power source, a magnetic field generator, and a parallel capacitor. This innovative setup allows for effective plasma generation through the application of high-frequency currents.

Career Highlights

Shigeki Amadatsu is currently associated with Daihen Corporation, a leading company in the field of electrical and plasma technologies. His work at Daihen has positioned him as a key player in advancing plasma generation technologies, contributing to the company's reputation for innovation and excellence.

Collaborations

Throughout his career, Amadatsu has collaborated with notable colleagues, including Michio Taniguchi and Kazuki Kondo. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Shigeki Amadatsu's contributions to plasma technology through his innovative patents and collaborations highlight his role as a leading inventor in this field. His work continues to influence advancements in plasma applications, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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