The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2018
Filed:
Aug. 25, 2016
Applicant:
Daihen Corporation, Osaka-shi, Osaka, JP;
Inventors:
Michio Taniguchi, Osaka, JP;
Shigeki Amadatsu, Osaka, JP;
Assignee:
DAIHEN Corporation, Osaka, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/321 (2013.01); H01J 37/3266 (2013.01); H01J 37/32339 (2013.01); H01J 37/32458 (2013.01); H01J 37/32513 (2013.01); H01J 2237/327 (2013.01); H01J 2237/332 (2013.01); H01J 2237/334 (2013.01);
Abstract
An inductive-coupling plasma generation apparatus in which coupling can be made stronger and power can be used more effectively than in a conventional technique. The inductive-coupling plasma generation apparatus includes an electroconductive chamber with a toroidal-shaped electrical discharge space formed inside. The plasma generation apparatus also includes a high-frequency power source connected to the chamber. The power source is configured to cause a high-frequency current to flow through electroconductive material forming the chamber along a toroidal direction.