The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2026
Filed:
Jun. 13, 2024
Daihen Corporation, Osaka, JP;
Ryoji Tamaki, Osaka, JP;
Hayato Notomi, Osaka, JP;
Shigeki Amadatsu, Osaka, JP;
Shinichi Hasegawa, Osaka, JP;
DAIHEN CORPORATION, Osaka, JP;
Abstract
A plasma processing apparatus includes: an inner electrode; an electrode holder; an outer electrode; an insulating member that surrounds the inner electrode and the electrode holder; a fin member for forming a swirling flow around the inner electrode by causing a process gas supplied to an inner side of the insulating member to swirl; and a nozzle that blows the swirling flow converted into a plasma state. The insulating member is directly or indirectly secured to the outer electrode, and the fin member is secured to the electrode holder while being spaced from the inner electrode, and is in contact with an inner circumferential surface of the insulating member.