The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2019
Filed:
Sep. 20, 2017
Applicant:
Daihen Corporation, Osaka-shi, Osaka, JP;
Inventors:
Hayato Notomi, Osaka, JP;
Shigeki Amadatsu, Osaka, JP;
Eiji Tatebe, Osaka, JP;
Michio Taniguchi, Osaka, JP;
Assignee:
DAIHEN Corporation, Osaka, JP;
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/46 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H05H 1/46 (2013.01); H01J 37/321 (2013.01); H01J 37/3244 (2013.01); H01J 37/3266 (2013.01); H01J 37/32174 (2013.01); H05H 2001/4675 (2013.01);
Abstract
A plasma generation apparatus includes a chamber, a high-frequency power source, a magnetic field generator and a parallel capacitor. The chamber has an inner, toroidal-shaped electric discharge space. The high-frequency power source outputs a high-frequency current to the magnetic field generator, which generates a high-frequency magnetic field upon flowing of the high-frequency current therethrough. The parallel capacitor is connected in parallel to the magnetic field generator.