Company Filing History:
Years Active: 2019-2020
Title: Eiji Tatebe: Innovator in Plasma Technology
Introduction
Eiji Tatebe is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of plasma technology, holding a total of 2 patents. His work focuses on developing advanced plasma generating devices that have applications in various industries.
Latest Patents
Tatebe's latest patents include a plasma generating device and a plasma generation apparatus with a high-frequency power source. The plasma generating device is an inductively coupled plasma generating device that features an antenna coil for generating plasma in a vacuum chamber. It utilizes a high-frequency power source connected to a reference potential for plasma potential, applying high-frequency voltage to the antenna coil. The resonance circuit in this device is designed with electrical symmetry, enhancing its efficiency.
The plasma generation apparatus includes a chamber with a toroidal-shaped electric discharge space, a high-frequency power source, a magnetic field generator, and a parallel capacitor. The high-frequency power source outputs current to the magnetic field generator, which creates a high-frequency magnetic field. This innovative design allows for effective plasma generation.
Career Highlights
Eiji Tatebe is associated with Daihen Corporation, a company known for its advancements in electrical and plasma technologies. His work at Daihen has positioned him as a key player in the development of cutting-edge plasma solutions.
Collaborations
Tatebe collaborates with talented individuals such as Hayato Notomi and Shigeki Amadatsu. Their combined expertise contributes to the innovative projects at Daihen Corporation.
Conclusion
Eiji Tatebe's contributions to plasma technology through his patents and work at Daihen Corporation highlight his role as a leading inventor in this field. His innovative designs continue to push the boundaries of what is possible in plasma applications.