Daihen Corporation

Eiji Tatebe

Shigeki Amadatsu

Hayato Notomi

Michio Taniguchi

A plasma generating device is an inductively coupled plasma generating device comprising an antenna coil that generates plasma in a vacuum chamber, a high-frequency power source that is connected to a reference potential to be referred for plasma potential and that applies high-frequency voltage to the antenna coil, and a resonance circuit provided between the antenna coil and the high-frequency power source. The resonance circuit comprises a first series reactance element that is connected in series to one end portion of the antenna coil and has at least a capacitance component and a second series reactance element that is connected in series to the other end portion of the antenna coil and has at least a capacitance component. The circuit configuration at one side and the circuit configuration at the other side are electrically symmetrical.

Plasma generating device

A plasma generation apparatus includes a chamber, a high-frequency power source, a magnetic field generator and a parallel capacitor. The chamber has an inner, toroidal-shaped electric discharge space. The high-frequency power source outputs a high-frequency current to the magnetic field generator, which generates a high-frequency magnetic field upon flowing of the high-frequency current therethrough. The parallel capacitor is connected in parallel to the magnetic field generator.

Growing community of inventors

Osaka, Japan

Eiji Tatebe