Company Filing History:
Years Active: 2003-2009
Title: Innovations by Inventor Shi-Ping Wang
Introduction
Shi-Ping Wang is a notable inventor based in Fremont, CA (US). He has made significant contributions to the field of chemical mechanical polishing, holding a total of 7 patents. His work focuses on enhancing the efficiency and effectiveness of polishing processes for conductive materials.
Latest Patents
Among his latest patents is the "Grooved Retaining Ring," which describes a retaining ring designed for chemical mechanical polishing. This innovative ring features a bottom surface with non-intersecting grooves, with alternating grooves positioned at opposing angles. Another significant patent is the "Method of Chemical Mechanical Polishing with High Throughput and Low Dishing." This patent outlines a method and apparatus for polishing conductive materials while minimizing dishing of features and reducing remaining residues. The method involves processing a substrate by polishing it to remove bulk conductive material, utilizing a specific ratio of carrier head rotational speed to platen rotational speed. Additionally, it details polishing the substrate at varying relative linear velocities to optimize the process.
Career Highlights
Shi-Ping Wang is currently employed at Applied Materials, Inc., where he continues to innovate in the field of materials processing. His expertise and inventions have contributed to advancements in the industry, particularly in improving polishing techniques.
Collaborations
Some of his notable coworkers include Shijian Li and Fred Conrad Redeker. Their collaborative efforts have further enhanced the research and development initiatives at Applied Materials, Inc.
Conclusion
Shi-Ping Wang's contributions to the field of chemical mechanical polishing through his patents and work at Applied Materials, Inc. highlight his role as a leading inventor in this specialized area. His innovative approaches continue to shape the future of materials processing.