The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2009
Filed:
Aug. 29, 2006
Applicants:
Shi-ping Wang, Fremont, CA (US);
Alain Duboust, Sunnyvale, CA (US);
Antoine P. Manens, Santa Clara, CA (US);
Wei-yung Hsu, Santa Clara, CA (US);
Jose Salas-vernis, Santa Clara, CA (US);
Zhihong Wang, Santa Clara, CA (US);
Inventors:
Shi-Ping Wang, Fremont, CA (US);
Alain Duboust, Sunnyvale, CA (US);
Antoine P. Manens, Santa Clara, CA (US);
Wei-Yung Hsu, Santa Clara, CA (US);
Jose Salas-Vernis, Santa Clara, CA (US);
Zhihong Wang, Santa Clara, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01); B24B 41/06 (2006.01);
U.S. Cl.
CPC ...
Abstract
A retaining ring for chemical mechanical polishing is described. The ring has a bottom surface with non-intersecting grooves. Alternating grooves are at opposing angles to one another.