The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2003
Filed:
Nov. 10, 2000
Shijian Li, San Jose, CA (US);
Manoocher Birang, Los Gatos, CA (US);
Ramin Emami, San Jose, CA (US);
Andrew Nagengast, Sunnyvale, CA (US);
Douglas Orcutt Brown, San Jose, CA (US);
Shi-Ping Wang, Fremont, CA (US);
Martin Scales, San Jose, CA (US);
John White, Hayward, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Generally, a method and apparatus for retaining polishing material is provided. In one embodiment, the apparatus includes a platen having a top surface, a plurality of channels and one or more vacuum ports. The top surface is adapted to support the polishing material. The plurality of channels are formed in a polishing area of the top surface. The vacuum ports are disposed in the platen and at least one port is in communication with at least one of the channels. Upon application of a vacuum to the ports, the channels remove fluids under the polishing material while securing the polishing material to the top surface.