Company Filing History:
2 out of 13,713 
1 out of 832,843 Years Active: 2002-2003
Title: Martin Scales: Innovator in Chemical Mechanical Polishing Technology
Introduction
Martin Scales is a notable inventor based in San Jose, CA, with a focus on advancements in chemical mechanical polishing technology. He holds a total of 3 patents that contribute to the efficiency and effectiveness of polishing materials used in various applications.
Latest Patents
One of his latest patents is titled "Platen for Retaining Polishing Material." This invention provides a method and apparatus for retaining polishing material, featuring a platen with a top surface, multiple channels, and vacuum ports. The design allows for the removal of fluids under the polishing material while securely holding it in place. Another significant patent is "Apparatus and Methods for Chemical Mechanical Polishing with an Incrementally Advanceable Polishing Sheet." This apparatus includes a rotatable platen and a polishing sheet that can be incrementally advanced, ensuring consistent polishing across the substrate.
Career Highlights
Throughout his career, Martin has worked with prominent companies, including Applied Materials, Inc. His contributions to the field have been recognized for enhancing the performance of polishing processes in various industries.
Collaborations
Martin has collaborated with talented individuals such as Manoocher Birang and Shijian Li, further enriching his work and innovations in the field.
Conclusion
Martin Scales is a distinguished inventor whose work in chemical mechanical polishing technology has made a significant impact. His patents reflect his commitment to innovation and excellence in the industry.