Taichung, Taiwan

Sheng-Fen Chiu


Average Co-Inventor Count = 3.3

ph-index = 3

Forward Citations = 21(Granted Patents)


Location History:

  • Hsinchu, TW (2001 - 2002)
  • Taichun, TW (2002)
  • Taichung, TW (2002 - 2003)

Company Filing History:


Years Active: 2001-2003

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5 patents (USPTO):Explore Patents

Title: Innovations of Sheng-Fen Chiu

Introduction

Sheng-Fen Chiu is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of technology, particularly in the development of advanced processing techniques. With a total of 5 patents to his name, Chiu's work has had a considerable impact on the industry.

Latest Patents

One of his latest patents is a "Method to improve surface uniformity of a layer of arc used for the creation of contact plugs." This invention provides a new processing sequence for creating a layer of ARC. A first layer of ARC is deposited over a supporting surface, followed by a blanket etch that leaves openings filled with ARC material. A second layer of ARC is then applied, ensuring uniform thickness over the supporting surface. Another significant patent is the "Structure and process of via chain for misalignment test." This invention employs a structure or process of the via chain to test misalignment, featuring a first via chain in one direction and a second via chain in another direction, allowing for easy detection of misalignment.

Career Highlights

Throughout his career, Sheng-Fen Chiu has worked with various companies, including Promos Technologies, Inc. His expertise in the field has allowed him to develop innovative solutions that address complex challenges in technology.

Collaborations

Chiu has collaborated with notable individuals such as Jesse Chung and Hsiao-Lei Wang, contributing to the advancement of technology through teamwork and shared knowledge.

Conclusion

Sheng-Fen Chiu's contributions to the field of technology through his patents and collaborations highlight his innovative spirit and dedication to advancing industry standards. His work continues to influence the development of new technologies and processes.

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