Shaun Evans

Title: Shaun Evans - Innovator in Lithographic Technology

Introduction

Shaun Evans is a notable inventor based in Danbury, Connecticut, recognized for his contributions to lithographic technology. He holds a patent that addresses the challenges associated with handling reticles in lithography apparatuses. His innovative approach aims to enhance the precision and reliability of these systems.

Latest Patents

Shaun Evans holds a patent for a "Reticle Gripper Damper and Isolation System for Lithographic Apparatuses." This invention describes methods, devices, and systems designed to handle reticles while minimizing vibrations in a reticle handler. The apparatus includes a reticle handler arm, a reticle baseplate for holding the reticle, and a gripper that connects the baseplate to the arm. The design incorporates a static structure, an isolation structure, and damping elements to effectively reduce vibrations during operation.

Career Highlights

Throughout his career, Shaun has worked with prominent companies in the field, including ASML Holding N.V. and ASML Netherlands B.V. His experience in these organizations has contributed significantly to his expertise in lithographic systems and technologies.

Collaborations

Shaun has collaborated with notable professionals in his field, including Roberto B. Wiener and Peter Conrad Kochersperger. These collaborations have likely enriched his work and contributed to advancements in lithographic technology.

Conclusion

Shaun Evans is a distinguished inventor whose work in developing a reticle gripper damper and isolation system has made a significant impact on lithographic technology. His innovative solutions continue to enhance the efficiency and effectiveness of lithography apparatuses.