Asml Netherlands B.v.

Asml Holding N.v.

Shaun Evans

Peter Conrad Kochersperger

Roberto B Wiener

Martinus Agnes Willem Cuijpers

Boris Kogan

Robert Jeffrey Wade

Embodiments herein describe methods, devices, and systems for a reticle gripper damper and isolation system for handling reticles and reducing vibrations in a reticle handler for lithography apparatuses and systems. A reticle handler apparatus includes a reticle handler arm, a reticle baseplate configured to hold the reticle, and a gripper arranged to connect the reticle baseplate to the reticle handler arm. The gripper includes a static structure that is coupled to the reticle handler arm, an isolation structure that is coupled to the static structure, and one or more damping elements. The gripper is configured to reduce vibrations of the reticle in the reticle handler apparatus using the one or more damping elements.

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Danbury, CT, United States of America

Shaun Evans