This inventor holds 5 USPTO granted patents. Top assignees: Conexant Systems, Inc., Newport Fab, LLC. Active years: 2001-2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001-2004
Title: The Innovative Contributions of Shao-Wen Hsia
Introduction
Shao-Wen Hsia is a prominent inventor based in Mission Viejo, CA (US). He has made significant contributions to the field of semiconductor fabrication, holding a total of 5 patents. His work focuses on advanced methods and apparatuses that enhance the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Among his latest patents is a method and apparatus for high-resolution in-situ plasma etching of inorganic and metal films. This innovation allows for the plasma etching of both metal and inorganic dielectric layers within a single chamber during deep sub-micron semiconductor fabrication. The process utilizes fluorine-based chemistries, or a mixture of fluorine and chlorine-based chemistries, to etch the inorganic dielectric layer. A switch to chlorine-based chemistries is then made to etch the metal layer, with overetching performed to clear any residuals. Another notable patent is related to a semiconductor device and process, which includes the formation of tungsten contact plugs suitable for very small geometry devices. This process involves depositing a tungsten barrier layer into vias through ionized metal plasma deposition, ensuring low resistance in the contact plugs even in small geometry applications.
Career Highlights
Shao-Wen Hsia has worked with several notable companies throughout his career, including Conexant Systems, Inc. and Newport Fab, LLC. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.
Collaborations
Shao-Wen has collaborated with several professionals in his field, including Maureen R. Brongo and Michael J. Berg. These collaborations have contributed to the advancement of his research and the successful implementation of his patented technologies.
Conclusion
Shao-Wen Hsia's contributions to semiconductor fabrication through his innovative patents and collaborations highlight his significant role in advancing technology in this field. His work continues to influence the efficiency of semiconductor manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile