Shao-An Wang

Title: Shao-An Wang: Innovator in Semiconductor Technology

Introduction

Shao-An Wang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique patent that enhances the manufacturing process of semiconductor devices.

Latest Patents

Shao-An Wang holds a patent titled "Semiconductor device including stacked via contact and method for manufacturing the same." This patent describes a method for manufacturing a semiconductor device that involves several key steps. These steps include forming a conductive feature in a first dielectric layer, creating a second dielectric layer on top of the first, and forming a trench that penetrates through the second dielectric layer, terminating at the conductive feature. The process continues with the formation of a contact layer in the trench and on the conductive feature, followed by etching back the contact layer to create a first via contact feature that is electrically connected to the conductive feature. Finally, a second via contact feature is formed on the first via contact feature within the trench. This innovative approach streamlines the manufacturing process and improves the efficiency of semiconductor devices.

Career Highlights

Shao-An Wang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading organization in the semiconductor industry. His role at the company allows him to apply his expertise in semiconductor technology and contribute to cutting-edge advancements in the field.

Collaborations

Due to space constraints, the collaborations section has been omitted.

Conclusion

Shao-An Wang's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the industry. His work continues to influence the development of efficient semiconductor manufacturing processes.