Shang-Wern Chang

Title: Innovations of Shang-Wern Chang

Introduction

Shang-Wern Chang is a notable inventor based in Zhubei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of six patents. His work focuses on materials and methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

One of Shang-Wern Chang's latest patents is titled "Materials and methods for forming resist bottom layer." This innovative method involves forming a bottom layer over a semiconductor substrate. The bottom layer consists of a polymer bonded to a first cross-linker and a second cross-linker. The first cross-linker is designed to be activated by ultraviolet (UV) radiation, while the second cross-linker is activated by heat at a specific temperature. The process includes exposing the bottom layer to a UV source to activate the first cross-linker, resulting in an exposed bottom layer. Following this, the method requires baking the exposed bottom layer to activate the second cross-linker.

Career Highlights

Shang-Wern Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have contributed to the advancement of semiconductor technologies.

Collaborations

Shang-Wern Chang has collaborated with several talented individuals in his field, including Chien-Wei Wang and Ching-Yu Chang. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Shang-Wern Chang's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant inventor in the industry. His innovative methods continue to influence the field and pave the way for future advancements.